EDUCATION
Ph.D. in Electrical Engineering (GPA: 3.83) University of Massachusetts at Lowell (2012)
Thesis: Surface Plasmon Enhanced Quantum Dot Infrared Photodetector (QDIP)
Non-Thesis: Infrared Antennas on QDIP
M.S. in Electrical Engineering (GPA: 3.87) University of Massachusetts at Lowell (2009)
Thesis: Dark Current Reduction on Quantum Dot Infrared Photodetector
Non-thesis research: Flexible Transistor
B.S. in Electrical Engineering (GPA: 3.03) Chulalongkorn University, Bangkok, Thailand (2005)
Project: Wireless Network Design in Engineering Department and Chulalongkorn Campus.
RESEARCH SKILLS
• Five years clean room experience in Center for Nanoscale Systems, Harvard University
• Hands-on experience on semiconductor device fabrication (III-V) and characterization including standard photolithography, optical direct-write lithography system, patterning imprint process ,thermal evaporation, electron beam evaporation, sputtering deposition, wet etching, RIE, PECVD, AFM, SEM, FIB, ellipsometer, rapid thermal annealing, wafer lapper & polisher.
• Proficient with electronic instrument such as FTIR spectroscopy, oscilloscopes, amplifiers, spectrum analyzers, tunable laser, function generators, I-V measurement.
• Modeling and analysis using Rsoft, LabTracer, Matlab, OPUS, Cadence (Virtuoso) AutoCAD, 4NEC2, OriginLab, Microsoft Office.
RESEARCH EXPERIENCE
Post-doctoral researchers, ECE depart. University of Massachusetts at Lowell 9/2012 – Present
Research Assistance, ECE depart. University of Massachusetts at Lowell 9/2007 – 8/2012
Key Projects:
• Plasmonics Polarizer
Design novel electrically switchable plasmonic polarizers (thin film) capable of achieving electrically polarization switching on semiconductor infrared focal plane array.
• Quantum Dot Infrared Photodetector
Fabricate QDIP sample from MBE growth wafer by standard photolithography in the cleanroom
Operate manual and automated test procedures to evaluate QDIP performance (Spectrum Response, Photo-responsivity, Photo-detectivity, and Quantum Efficiency).
Analyze test data and generate report.
Design photolithography mask for plasmonics pattern added up on the detector
• Flexible Transistor (won 2009 IDTechEx Printed Electronics Europe Awards)
Supported the co-op manufacturing company to design the printing pattern
Test I-V characteristics of CNT transistor
INDUSTRY EXPERIENCE
Optical Engineer (Process and Test Engineer) (2005-2006)
Fabrinet, Manufacturing Headquarters, Patumthanee, Thailand
• Prepared, set up, and maintained line production of optical switches and hubs, optical distributors, and optical amplifiers. Took care of all instruments in line production
• Repaired recalls and returns, debugged faults/rejects of the product at the manufacturing level
• Planned timelin...
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